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Low-temperature PECVD deposition of highly conductive microcrystalline silicon thin films

✍ Scribed by A. M. Nardes; A. M. de Andrade; F. J. Fonseca; E. A. T. Dirani; R. Muccillo; E. N. S. Muccillo


Book ID
110442321
Publisher
Springer US
Year
2003
Tongue
English
Weight
457 KB
Volume
14
Category
Article
ISSN
0957-4522

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