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Particulars of studying the roughness of substrates for multilayer X-ray optics using small-angle X-ray reflectometry, atomic-force, and interference microscopy

✍ Scribed by M. M. Barysheva; Yu. A. Vainer; B. A. Gribkov; M. V. Zorina; A. E. Pestov; D. N. Rogachev; N. N. Salashchenko; N. I. Chkhalo

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