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Particle generation and film formation in an atmospheric-pressure chemical vapour deposition process using tetraethylorthosilicate

✍ Scribed by Motoaki Adachi; Kikuo Okuyama; Noboru Tohge

Book ID
105106399
Publisher
Springer
Year
1995
Tongue
English
Weight
955 KB
Volume
30
Category
Article
ISSN
0022-2461

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πŸ“œ SIMILAR VOLUMES

[Computer Aided Chemical Engineering] Eu
[Computer Aided Chemical Engineering] European Symposium on Computer Aided Process Engineering-10 Volume 8 || Simulation of silica deposition in an atmospheric pressure chemical vapour deposition reactor, using a modified CFD software
✍ Nieto, J.P. πŸ“‚ Article πŸ“… 2000 πŸ› Elsevier 🌐 English βš– 388 KB

This book includes papers presented at ESCAPE-10, the 10th European Symposium on Computer Aided Process -Engineering, held in Florence, Italy, 7-10th May, 2000. The scientific program reflected two complementary strategic objectives of the 'Computer Aided Process Engineering' (CAPE) Working Party: