Chemical vapour deposition of epitaxial SiGe thin films from SiH4GeH4HClH2 gas mixtures in an atmospheric pressure process

✍ Scribed by H. Kühne; Th. Morgenstern; P. Zaumseil; D. Krüger; E. Bugiel; G. Ritter

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 228 KB
• Volume: 222
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(92)90033-8