Oxygen and carbon incorporation in low temperature epitaxial Si films grown by rapid thermal chemical vapor deposition (RTCVD)

✍ Scribed by M. L. Green; D. Brasen; M. Geva; W. Reents; F. Stevie; H. Temkin

• Book ID: 112812164
• Publisher: Springer US
• Year: 1990
• Tongue: English
• Weight: 715 KB
• Volume: 19
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/bf02651975