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Oxide formation on the silicon (111) surface studied by Auger electron spectroscopy and by low energy electron loss spectroscopy

✍ Scribed by N. Lieske; R. Hezel

Publisher: Elsevier Science
Year: 1979
Tongue: English
Weight: 293 KB
Volume: 61
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(79)90462-0

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