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Characterization of amorphous silicon oxide and silicon nitride films by Auger electron spectroscopy and low energy electron loss spectroscopy

✍ Scribed by R. Hezel; N. Lieske

Publisher: Elsevier Science
Year: 1979
Tongue: English
Weight: 56 KB
Volume: 58
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(79)90254-2

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