✦ LIBER ✦

Oxidation of silicon in RF induced oxygen plasma

✍ Scribed by S. K. Sharma; B. C. Chakravarty; S. N. Singh; B. K. Das

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Formation of ultrathin oxide films on si

✍ Atanasova, E. D. ;Kirov, K. I. ;Kantardjeva, E. I. 📂 Article 📅 1981 🏛 John Wiley and Sons 🌐 English ⚖ 552 KB

I–V characteristics of tunnel MOS struct

✍ E.D. Atanassova; D.I. Pushkarov 📂 Article 📅 1982 🏛 Elsevier Science 🌐 English ⚖ 648 KB

Oxidation of tantalum silicide thin film

✍ R.Gómez-San Román; R. Pérez-Casero; J. Perrière; J.P. Enard; J.M. Martínez-Duart 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 257 KB

Low-temperature oxidation of silicon in

✍ S. K. Ray; C. K. Maiti; N. B. Chakraborti 📂 Article 📅 1990 🏛 Springer 🌐 English ⚖ 440 KB

RF Annealing of Defects Induced in SiO2

✍ Szekeres, A. ;Alexandrova, S. 📂 Article 📅 1983 🏛 John Wiley and Sons 🌐 English ⚖ 246 KB

Oxygen precipitation at the oxidation-in

✍ Sato, N. ;Kajiwara, K. ;Shibata, A. 📂 Article 📅 1973 🏛 John Wiley and Sons 🌐 English ⚖ 120 KB