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Optimization of growth condition for wide dislocation-free GaAs on Si substrate by microchannel epitaxy

โœ Scribed by Y.S Chang; S Naritsuka; T Nishinaga


Book ID
108342762
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
217 KB
Volume
192
Category
Article
ISSN
0022-0248

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Growth of n-GaAs layer on a rough surfac
โœ B. Azeza; L. Sfaxi; R. M'ghaieth; A. Fouzri; H. Maaref ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 749 KB

The n-GaAs layer was successfully grown on (1 0 0) p-type silicon (p-Si) substrate by molecular beam epitaxy (MBE) using rough surface buffer layer (RSi) to reduce the tensile stress in GaAs layer grown on Si substrate. We have reviewed the initial stage and the recombination of GaAs epitaxial layer