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Optimal phase conflict removal for layout of dark field alternating phase shifting masks

โœ Scribed by Berman, P.; Kahng, A.B.; Vidhani, D.; Huijuan Wang; Zelikovsky, A.


Book ID
119778586
Publisher
IEEE
Year
2000
Tongue
English
Weight
319 KB
Volume
19
Category
Article
ISSN
0278-0070

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