Optical study of Si nanocrystals in Si/SiO2 layers by spectroscopic ellipsometry
β Scribed by A. En Naciri; M. Mansour; L. Johann; J.J. Grob; C. Eckert
- Book ID
- 113822721
- Publisher
- Elsevier Science
- Year
- 2004
- Tongue
- English
- Weight
- 348 KB
- Volume
- 216
- Category
- Article
- ISSN
- 0168-583X
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π SIMILAR VOLUMES
In this paper results concerning optical analysis of the SiO 2 =Si system performed by the combined ellipsometric and reflectometric method used in multiple-sample modification will be presented. This method is based on combining both the single-wavelength method and the dispersion method. Three mod
Si-rich-SiO 2 layers with excess silicon of 45-50% were grown by RF magnetron co-sputtering from pure SiO 2 and Si targets and were studied by Raman scattering, HRTEM, electron-paramagnetic resonance and X-ray diffraction (XRD) methods as well as by photo-voltage technique operated at different temp