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Optical properties of amorphous carbon nitride synthesized on Si by ECR-CVD

โœ Scribed by X.W Liu; C.H Tseng; J.H Lin; L.T Chao; H.C Shih


Book ID
108422833
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
168 KB
Volume
135
Category
Article
ISSN
0257-8972

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Optical properties of plasma deposited a
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Amorphous carbon nitride thin films were deposited on polymer substrates using radio frequency (rf) plasma in a mixture of nitrogen (N 2 ) and acetylene (C 2 H 2 ) gasses. The samples were prepared at different rf plasma power (350, 400, 450, 500, and 550 W), at constant plasma exposure time of 10 m