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Optical characterization of SnO2:F films by spectroscopic ellipsometry

✍ Scribed by F. Atay; V. Bilgin; I. Akyuz; E. Ketenci; S. Kose

Book ID
116672383
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
631 KB
Volume
356
Category
Article
ISSN
0022-3093

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## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ion‐assisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter