Effect of rapid thermal annealing on Zn1
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J. H. Yu; J. H. Kim; D. S. Park; T. S. Jeong; C. J. Youn; K. J. Hong
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Article
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2010
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John Wiley and Sons
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English
โ 714 KB
Zn 1-x Cd x O layers were deposited on the sapphire substrate using the radio-frequency magnetron co-sputtering system. The grown Zn 1-x Cd x O layers were carried out in the post-annealing treatment for 1 min at the 800 o C oxygen-ambient by the rapid thermal annealing (RTA) method. X-ray diffracti