๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

On void nucleation and growth in metal interconnect lines under electromigration conditions

โœ Scribed by Nix, W. D. ;Arzt, E.


Book ID
112809967
Publisher
The Minerals, Metals & Materials Society
Year
1992
Tongue
English
Weight
725 KB
Volume
23
Category
Article
ISSN
1543-1916

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Nano- and micrometer-scale thin-film-int