On the use of the photoacoustic technique for the measurement of the thermomechanical properties of semiconductor two-layer systems

✍ Scribed by A. Cruz Orea; I. Delgadillo; H. Vargas; J.L. Pichardo; J.J. Alvarado-Gil; L.C.M. Miranda

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 452 KB
• Volume: 100
• Category: Article
• ISSN: 0038-1098
• DOI: 10.1016/s0038-1098(96)00468-1

✦ Synopsis

The photoacoustic technique is used in semiconductor two-layer systems for the determination of thermal properties and thermal expansion coefficient. The two-layer systems studied were amorphous silicon-glass and Alo,2Gao,sAs-GaAs. Our results show that the proposed method is a reliable technique for the characterization of other semiconductor two-layers systems.