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On the spin reorientation transition in ultra-thin Ni/Cu(0 0 1) films

✍ Scribed by A. Hucht; K.D. Usadel


Book ID
114229775
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
97 KB
Volume
198-199
Category
Article
ISSN
0304-8853

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A series of Ni films with thickness from 0.2 monolayers (ML) to 12.5 ML were epitaxially grown on a Pd(1 0 0) substrate at room temperature. Growth and morphology were investigated by scanning tunneling microscopy (STM), reflection-high-energy-electron diffraction (RHEED) and Auger electron spectros