✦ LIBER ✦

On the role of ion bombardment parameters in AES sputter depth profiling of Ta2O5/Ta with Ar+and Xe+

✍ Scribed by J. Scholtes; H. Oechsner

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Original and sputtering induced interfac

✍ A Rar; I Kojima; D.W Moon; S Hofmann 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 277 KB

Depth profiling of the altered layer in

✍ P. Varga; E. Taglauer 📂 Article 📅 1984 🏛 Elsevier Science 🌐 English ⚖ 365 KB

The influence of Ar+ and Xe+ ion beam in

✍ J Liday; V Kliment; P Vogrinčič; S Tomek 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 410 KB

Defect depth profiling using photolumine

✍ J.T Hsieh; J.M Hwang; H.L Hwang; O Breitschädel; H Schweizer 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 148 KB