✦ LIBER ✦

On the oxide interface micro-roughness in MOS devices : I. Placencia, J. Sune, E. Farres, N. Barniol and X. Aymerich. Vacuum39(7/8), 771 (1989)

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📜 SIMILAR VOLUMES

Breakdown in SiO2 films in VLSI MOS stru

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 133 KB

On the oxide interface micro-roughness i

✍ I Placencia; J Suñé; E Farrés; N Barniol; X Aymerich 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 342 KB