✦ LIBER ✦

Breakdown in SiO2 films in VLSI MOS structures : J. Sune, I.Placencia, E. Farres, N. Barniol and X. Aymerich. Vacuum39(7/8), 765 (1989)

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

On the oxide interface micro-roughness i

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 133 KB

Breakdown of SiO2 films in VLSI MOS stru

✍ J Suñe; I Placencia; E Farrés; N Barniol; X Aymerich 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 394 KB

Gate oxide breakdown statistics in wearo

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 134 KB