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On the Monte Carlo simulation program “RESIS” for electron exposure of resists

✍ Scribed by P.R. Deshmukh; W.S. Khokle

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 601 KB
Volume: 32
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(89)90075-0

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