Vanadium oxide thin film has been deposited on glass substrate at room temperature using pulsed laser deposition with the laser fluence of 1.4 J/cm 2 under high vacuum. X-ray photoelectron spectroscopy analysis shows that the film is oxygen deficient compared to the stoichiometric V 2 O 5 . X-ray di
โฆ LIBER โฆ
On the growth mechanism of pulsed-laser deposited vanadium oxide thin films
โ Scribed by C.V Ramana; R.J Smith; O.M Hussain; C.M Julien
- Book ID
- 108215064
- Publisher
- Elsevier Science
- Year
- 2004
- Tongue
- English
- Weight
- 277 KB
- Volume
- 111
- Category
- Article
- ISSN
- 0921-5107
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