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Off-stoichiometry effects on BiFeO3 thin films

โœ Scribed by A. Lahmar; K. Zhao; S. Habouti; M. Dietze; C.-H. Solterbeck; M. Es-Souni


Book ID
113916149
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
910 KB
Volume
202
Category
Article
ISSN
0167-2738

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BiFeO 3 thin films were grown by metal organic chemical vapour deposition (MOCVD) at the temperature T = 700 ยฐC using Fe(thd) 3 , Bi (C 6 H 5 ) 3 as volatile precursors. High thermal stability of Bi(C 6 H 5 ) 3 makes the film stoichiometry very sensible to the deposition conditions, in particular to