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Photoconductivity in BiFeO3 thin films

โœ Scribed by Basu, S. R.; Martin, L. W.; Chu, Y. H.; Gajek, M.; Ramesh, R.; Rai, R. C.; Xu, X.; Musfeldt, J. L.

Book ID
115466607
Publisher
American Institute of Physics
Year
2008
Tongue
English
Weight
609 KB
Volume
92
Category
Article
ISSN
0003-6951

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BiFeO 3 thin films were grown by metal organic chemical vapour deposition (MOCVD) at the temperature T = 700 ยฐC using Fe(thd) 3 , Bi (C 6 H 5 ) 3 as volatile precursors. High thermal stability of Bi(C 6 H 5 ) 3 makes the film stoichiometry very sensible to the deposition conditions, in particular to