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BiFeO3thin films: Novel effects

โœ Scribed by V R Palkar; R Pinto

Book ID
107586926
Publisher
Springer-Verlag
Year
2002
Tongue
English
Weight
126 KB
Volume
58
Category
Article
ISSN
0304-4289

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BiFeO 3 thin films were grown by metal organic chemical vapour deposition (MOCVD) at the temperature T = 700 ยฐC using Fe(thd) 3 , Bi (C 6 H 5 ) 3 as volatile precursors. High thermal stability of Bi(C 6 H 5 ) 3 makes the film stoichiometry very sensible to the deposition conditions, in particular to