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Observations of arc-plasma sprayed ferrite films on alumina substrates

✍ Scribed by C. W. D. Andrews; B. A. Fuller; I. Preece

Publisher
Springer
Year
1974
Tongue
English
Weight
802 KB
Volume
9
Category
Article
ISSN
0022-2461

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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane “S” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness