✦ LIBER ✦

O2+ and Xe+ depth profiling of 150 keV Cs+ implantation in Si and SiO2 by SIMS

✍ Scribed by M.K. Bhan; J.A. Kilner

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Mixing and chemical effects in SIMS dept

✍ M. Anderle; C.M. Loxton 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 292 KB

Depth profiling of ZrO2/SiO2/Si stacks—a

✍ V.A. Ignatova; T. Conard; W. Möller; W. Vandervorst; R. Gijbels 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 322 KB

Ultra-high depth resolution RBS and SIMS

✍ W.M. Arnoldbik; Z.X. Jiang; P.F.A. Alkemade; D.O. Boerma 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 430 KB

Cesium profiles in silicon and in SiO2-S

✍ A. Hurrle; G. Sixt 📂 Article 📅 1975 🏛 Springer 🌐 English ⚖ 799 KB

SIMS depth profiling of Si/SiO2/Si layer

✍ Antonino Licciardello; Alberto Torrisi; Salvatore Pignataro 📂 Article 📅 1989 🏛 John Wiley and Sons 🌐 English ⚖ 426 KB

Implantation of 100 keV H+ in MoO3 and T

✍ J.L. Peña; M.H. Farías; F. Sánchez Sinencio; E. Andrade; A. Robledo; K. López 📂 Article 📅 1980 🏛 Elsevier Science ⚖ 202 KB