Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristics

✍ Scribed by Georgieva, V.; Bogaerts, A.

• Book ID: 115469331
• Publisher: American Institute of Physics
• Year: 2005
• Tongue: English
• Weight: 508 KB
• Volume: 98
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1989439