Influence of the low-frequency source parameters on the plasma characteristics in a dual frequency capacitively coupled plasma reactor: Two dimensional simulations

✍ Scribed by Xiang Xu; Hao Ge; Shuai Wang; Zhongling Dai; Younian Wang; Aimin Zhu

• Book ID: 113855894
• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 851 KB
• Volume: 19
• Category: Article
• ISSN: 1002-0071
• DOI: 10.1016/j.pnsc.2008.08.010