Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor

✍ Scribed by S.-M. Suh; M.R. Zachariah; S.L. Girshick

• Book ID: 117129899
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 345 KB
• Volume: 33
• Category: Article
• ISSN: 0021-8502
• DOI: 10.1016/s0021-8502(02)00047-2