A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion

✍ Scribed by G. Evans; R. Greif

• Book ID: 107759719
• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 960 KB
• Volume: 37
• Category: Article
• ISSN: 0017-9310
• DOI: 10.1016/0017-9310(94)90155-4