N+/P junction leakage characteristics of Co salicide process for 0.15 μm CMOS devices

✍ Scribed by Key-Min Lee; Chel-Jong Choi; Joo-Hyoung Lee; Tae-Yeon Seong; Young-Jin Park; Sung-Kwon Hong; Jae-Gyung Ahn; Hi-Deok Lee

• Book ID: 114539090
• Publisher: IEEE
• Year: 2002
• Tongue: English
• Weight: 205 KB
• Volume: 49
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.998607