Novel Molecular Resist Based on Derivative of Cholic Acid.
β Scribed by Jin-Baek Kim; Hyo-Jin Yun; Young-Gil Kwon
- Book ID
- 101933959
- Publisher
- John Wiley and Sons
- Year
- 2003
- Weight
- 50 KB
- Volume
- 34
- Category
- Article
- ISSN
- 0931-7597
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
## Abstract **Summary:** A novel chemically amplified negativeβtone molecular resist for electronβbeam (EB) lithography was developed. The base matrix had six furan rings as a reactive functional group at its terminal. The resist containing the matrix, a crosslinker and a photoacid generator worked
This study examined the ultimate fine-pitch patterning performance in EUV lithography (EUVL) of a chemically amplified (CA) positive-tone resist based on low-molecular-weight amorphous polyphenol. This advanced resist is composed of the low-molecular-weight protected polyphenol 4,4 0 -methylenebis[2