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Novel Molecular Resist Based on Derivative of Cholic Acid.

✍ Scribed by Jin-Baek Kim; Hyo-Jin Yun; Young-Gil Kwon


Book ID
101933959
Publisher
John Wiley and Sons
Year
2003
Weight
50 KB
Volume
34
Category
Article
ISSN
0931-7597

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πŸ“œ SIMILAR VOLUMES


Novel Molecular Resist Based on a First
✍ Hajime Mori; Eisaku Nomura; Asao Hosoda; Yasuhito Miyake; Hisaji Taniguchi πŸ“‚ Article πŸ“… 2006 πŸ› John Wiley and Sons 🌐 English βš– 165 KB

## Abstract **Summary:** A novel chemically amplified negative‐tone molecular resist for electron‐beam (EB) lithography was developed. The base matrix had six furan rings as a reactive functional group at its terminal. The resist containing the matrix, a crosslinker and a photoacid generator worked

Performance of molecular resist based on
✍ Hiroaki Oizumi; Fumiaki Kumasaka; Yuusuke Tanaka; Taku Hirayama; Daiju Shiono; H πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 511 KB

This study examined the ultimate fine-pitch patterning performance in EUV lithography (EUVL) of a chemically amplified (CA) positive-tone resist based on low-molecular-weight amorphous polyphenol. This advanced resist is composed of the low-molecular-weight protected polyphenol 4,4 0 -methylenebis[2