𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Novel materials and device design by metal-organic chemical vapour deposition for use in IR emitters

✍ Scribed by Biefeld, R.M.; Kurtz, S.R.; Allerman, A.A.


Book ID
114455667
Publisher
The Institution of Electrical Engineers
Year
1997
Tongue
English
Weight
629 KB
Volume
144
Category
Article
ISSN
1350-2433

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Chemical vapour deposition of the oxides
✍ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 340 KB πŸ‘ 3 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar