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Novel Approach to Chemically Amplified Resist Materials for Next Generation of Lithography

✍ Scribed by Park, Kyoung-sun; Kim, Dae-yong; Choi, Sang-kuk; Suh, Dong Hack

Book ID: 118045606
Publisher: Institute of Pure and Applied Physics
Year: 2003
Tongue: English
Weight: 107 KB
Volume: 42
Category: Article
ISSN: 0021-4922
DOI: 10.1143/jjap.42.3877

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