✦ LIBER ✦

Nonempirical simulation of chemical deposition of silicon nitride films in CVD reactors

✍ Scribed by T. M. Makhviladze; A. Kh. Minushev; M. E. Sarychev

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Optical characterization of silicon nitr

✍ S García; JM Maŕtin; I Mártil; G González-Díaz 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 235 KB

Chemical vapor deposition of titanium–si

✍ Smith, Paul Martin; Custer, J. S. 📂 Article 📅 1997 🏛 American Institute of Physics 🌐 English ⚖ 490 KB

Physico-chemical properties of photo-CVD

✍ M. Berti; M. Meliga; G. Rovai; S. Stano; S. Tamagno 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 744 KB

Thermal annealing effect of silicon nitr

✍ Yasushi Deguchi; Michio Ohnishi; Yoshihiro Takahashi; Kazunori Ohnishi 📂 Article 📅 1997 🏛 John Wiley and Sons 🌐 English ⚖ 247 KB

Plasma deposition of silicon nitride fil

✍ Chue-San Yoo; Anthony G. Dixon 📂 Article 📅 1989 🏛 American Institute of Chemical Engineers 🌐 English ⚖ 747 KB

Physico-Chemical Properties of Plasma De

✍ Efimov, V. M. ;Panova, Z. V. ;Malygyn, A. V. ;Kovchavtsev, A. P. 📂 Article 📅 1992 🏛 John Wiley and Sons 🌐 English ⚖ 406 KB