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Non-Stoichiometric Oxide Surfaces and Ultra-thin Films: Characterisation of TiO2

✍ Scribed by R. A. Bennett; N. D. McCavish

Publisher
Springer
Year
2005
Tongue
English
Weight
363 KB
Volume
36
Category
Article
ISSN
1022-5528

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## Abstract The influence of nitrogen on the internal structure and so on the electrical properties of silicon thin films obtained by low‐pressure chemical vapor deposition (LPCVD) was studied using several investigation methods. We found by using Raman spectroscopy and SEM observations that a stro