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Deposition and characterisation of epitaxial oxide thin films for SOFCs

✍ Scribed by José Santiso; Mónica Burriel


Publisher
Springer
Year
2010
Tongue
English
Weight
950 KB
Volume
15
Category
Article
ISSN
1432-8488

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An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of