Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor

✍ Scribed by M. Degai; K. Kanomata; K. Momiyama; S. Kubota; K. Hirahara; F. Hirose

• Book ID: 118501982
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 626 KB
• Volume: 525
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2012.10.043