Non-destructive spectroscopic characterization of parchment documents
β Scribed by Marina Bicchieri; Michela Monti; Giovanna Piantanida; Flavia Pinzari; Armida Sodo
- Book ID
- 108298578
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 586 KB
- Volume
- 55
- Category
- Article
- ISSN
- 0924-2031
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An infrared spectroscopic ellipsometer devoted to the characterization of silicon microelectronics has recently been developed at SOPRA. Its main feature is the ability to measure on a small spot (803200 mm) with a high signal / noise ratio. An original patented optical design suppresses back face r
## 1. Introduction Silicon-on-insulator (SO1) structures implanted with 200 or 400 keV N Γ· ions at a dose of 7.5Γ1017cm 2 were studied by spectroscopic ellipsometry (SE). The SE measurements were carried out in the 300-700 nm wavelength (4.13-1.78 eV photon energy) range. The SE data were analysed