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Noise in boron doped amorphous/microcrystallization silicon films

✍ Scribed by Shibin Li; Zhiming Wu; Yadong Jiang; Wei Li; Naiman Liao; Junsheng Yu

Book ID
108060420
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
361 KB
Volume
254
Category
Article
ISSN
0169-4332

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## Abstract A series of hydrogenated silicon (Si:H) thin films of about 350 nm in thickness were fabricated on K9 glass substrate by plasma enhanced chemical vapor deposition. The transition between hydrogenated amorphous silicon (a‐Si:H) and microcrystalline hydrogenated silicon (ΞΌc‐Si:H) was char