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Nitrogen plasma annealing for low temperature Ta[sub 2]O[sub 5] films

✍ Scribed by Alers, G. B.; Fleming, R. M.; Wong, Y. H.; Dennis, B.; Pinczuk, A.; Redinbo, G.; Urdahl, R.; Ong, E.; Hasan, Z.

Book ID: 126619801
Publisher: American Institute of Physics
Year: 1998
Tongue: English
Weight: 287 KB
Volume: 72
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.120569

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