✦ LIBER ✦

Nitrogen distribution during oxidation of low and medium energy nitrogen-implanted silicon

✍ Scribed by D. Skarlatos; M. Perego; C. Tsamis; S. Ferrari; M. Fanciulli; D. Tsoukalas

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Interstitial injection during oxidation

✍ D. Skarlatos; C. Tsamis; M. Perego; M. Fanciulli; D. Tsoukalas 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 318 KB

Oxidation of very low energy nitrogen-im

✍ N. Kelaidis; D. Skarlatos; V. Ioannou-Sougleridis; C. Tsamis; Ph. Komninou; B. K 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 490 KB

Blocking of silicon oxidation by low-dos

✍ K. Schott; K. C. Hofmann; M. Schulz 📂 Article 📅 1988 🏛 Springer 🌐 English ⚖ 400 KB

High dose, low energy implantation of ni

✍ H.-J. Füsser; H. Oechsner 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 649 KB

The anomalous depth distribution of low

✍ JKY Wong; JA Kilner; AB Danilin; IV Charniy; LA Charniy 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 298 KB

Nitrogen implanted steels-aspects of oxi

✍ J.T.A. Pollock; R.A. Clissold; P.J. Paterson; C.J. Veitch 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 350 KB