𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Nitridation in NH3-H2O-mixtures

✍ Scribed by H. J. Grabke; S. Strauss; D. Vogel


Publisher
John Wiley and Sons
Year
2003
Tongue
German
Weight
553 KB
Volume
54
Category
Article
ISSN
0947-5117

No coin nor oath required. For personal study only.

✦ Synopsis


Exposures were conducted of iron, nickel, ferritic 1-18%Cr steels, austenitic 18%Cr-9%Ni-and 20%Cr-31%Ni-steels and a 16%Cr-Ni-base alloy at 500 8C in He-30%H 2 O and 70%H 2 O-30%NH 3 , to compare the corrosion behaviour of these materials in water vapor as in conventional power plants with their behaviour in a NH 3 -H 2 O mixture, i.e. under conditions of the "Kalina-cycle". After 50 h in He-H 2 O generally a dense oxide scale had grown on iron and on the steels, whereas the scale grown in NH 3 -H 2 O was porous, due to initial formation of the c 0 -and e-nitrides, which are converted to Fe 3 O 4 later. The porous scale allows internal nitridation of the Cr-steels, nitrogen is transferred into the metal phase and reacts to finely dispersed CrN-precipitates. This process causes stresses in the material and formation of cracks. The higher the Crcontent of the material, the worse is the damage of the materials surface.

Least corrosion damage occurs for iron and the 1%CrMo-steel, however, the inward penetration of nitridation is greatest, and after 5 years on the low Cr-steel a layer of about 15 mm would be embrittled by internal nitridation, formation of c 0 and e-nitride layers and external oxidation.

Nickel is strongly damaged by intermediate formation of instable Ni 3 N, which causes internal stresses and cracking, but also pore formation by its decomposition. The surface region of the 15%Cr-Ni-base alloy is also destroyed by internal nitridation and extrusion of Ni-particles, while for this material the inward penetration of nitridation is relatively slow due to the low solubility and diffusivity of N in Ni and Ni-alloys.


πŸ“œ SIMILAR VOLUMES


Crystalline carbon nitride deposition by
✍ Lim, S. F.; Wee, A. T. S.; Lin, J.; Chua, D. H. C. πŸ“‚ Article πŸ“… 1999 πŸ› John Wiley and Sons 🌐 English βš– 432 KB

Carbon nitride films have been deposited on Si(100) substrates by r.f. plasma-enhanced chemical vapour deposition (r.f.-PECVD) using an ethylene-ammonia-hydrogen (C 2 H 4 -NH 3 -H 2 ) source gas mixture followed by rapid thermal annealing (RTA) at 1000 Β°C for 2 min. The films were characterized in t

Ammonia oxidation in shock-heated NH3ξ—ΈN2
✍ S. Salimian; R.K. Hanson; C.H. Kruger πŸ“‚ Article πŸ“… 1984 πŸ› Elsevier Science 🌐 English βš– 857 KB

Ammonia oxidation, using N20 as a thermal source of O atoms, has been studied in a shock tube in the temperature range 1600-210OK. Concentration-time profiles of NH 3. N,O, H ~O, NO, and OH and relative concentration histories of NH 2 were monitored behind incident shock waves using laser-based abso