✦ LIBER ✦

NiMnGa nanostructures produced by electron beam lithography and Ar-ion etching

✍ Scribed by D. Auernhammer; M. Schmitt; M. Ohtsuka; M. Kohl

Book ID: 111633519
Publisher: Springer-Verlag
Year: 2008
Tongue: English
Weight: 916 KB
Volume: 158
Category: Article
ISSN: 1951-6355
DOI: 10.1140/epjst/e2008-00683-1

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Preparation of cross-sectional transmiss

Preparation of cross-sectional transmission electron microscopy samples by electron beam lithography and reactive ion etching

✍ Wetzel, J. T. 📂 Article 📅 1989 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 764 KB

TEM sample preparation, VLSI, semiconductor processing, Defect analysis A cross-sectional sample preparation technique is described that relies on lithographic and dry-etching processing, thus avoiding metallographic polishing and ion milling. The method is capable of producing cross-sectional trans

Superconducting submicron bridges fabric

Superconducting submicron bridges fabricated by electron beam lithography and dry etching

✍ W. Langheinrich; B. Spangenberg; R. Barth; H. Kurz 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 393 KB

Laterally-Coupled Distributed Feedback l

Laterally-Coupled Distributed Feedback laser fabricated with electron beam lithography and chemically assisted ion beam etching

✍ R.C. Tiberio; P.F. Chapman; J.P. Drumheller; R.D. Martin; S. Forouhar; R.J. Lang 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 831 KB

T-gate and airbridge fabrication for MMI

T-gate and airbridge fabrication for MMICs by combining multi-voltage electron-beam lithography and ion-beam lithography

✍ R.G. Woodham; R.M. Jones; D.G. Hasko; J.R.A. Cleaver; H. Ahmed 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 360 KB

Fabrication of bifocal microlenses on In

Fabrication of bifocal microlenses on InP and Si by Ar ion beam etching

✍ Ren Congxin; Xiao Deyuan; Chen Guoliang; Liu Xianghuai; Zou Shichang 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 522 KB

Ion and electron beam deposited masks fo

Ion and electron beam deposited masks for pattern transfer by reactive ion etching

✍ A. Notargiacomo; E. Giovine; L. Di Gaspare 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 408 KB

We report on the use of a carbon-rich Pt-based material, obtained by electron and ion beam assisted deposition from metal-organic precursor, as a mask for pattern transfer processes. Thin and narrow mask patterns subjected to oxygen plasma and reactive ion etching (RIE) of silicon in SF 6 were inves