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Nickel Displacement Deposition of Porous Silicon with Ultrahigh Aspect Ratio

✍ Scribed by Xu, Chengkun; Zhang, Xi; Tu, King-Ning; Xie, Yahong

Book ID: 121342673
Publisher: The Electrochemical Society
Year: 2007
Tongue: English
Weight: 730 KB
Volume: 154
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2430690

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