Ni- and Co-based silicides for advanced CMOS applications

✍ Scribed by J.A. Kittl; A. Lauwers; O. Chamirian; M. Van Dal; A. Akheyar; M. De Potter; R. Lindsay; K. Maex

• Book ID: 104305957
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 357 KB
• Volume: 70
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(03)00370-8

✦ Synopsis

The scaling behavior of Co, Co-Ni and Ni silicides to sub-40 nm gate length CMOS technologies with sub-100 nm junction depths was evaluated. Limitations were found for Co and Co-Ni alloy silicides, which exhibited an increase in sheet resistance at gate lengths below 40 nm and required high processing temperatures to achieve low junction leakage. Ni silicide was shown, in contrast, to have good scaling behavior, with a decrease in sheet resistance for decreasing gate lengths down to 30 nm, lower diode leakage (at similar sheet resistance) and lower silicide to p1 Si contact resistance than Co silicide. Key material issues impacting the applicability of NiSi to CMOS technologies were investigated. Studies of the kinetics of Ni Si growth were used to design a process that avoids excessive silicidation of small features. The thermal 2 degradation mechanisms of NiSi films were also studied. Thin films degraded morphologically with activation energies of |2.4 eV. Thick films degraded morphologically at low temperatures and by transformation to NiSi at high temperatures, 2 suggesting a higher activation energy for the latter mechanism. Pt alloying was shown to help stabilize NiSi films against morphological degradation.