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New oxygen donors formed at 700 °C in silicon

✍ Scribed by Akira Ohsawa; Ritsuo Takizawa; Kouichirou Honda

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Oxygen-Related Donors Formed at 600 °C i

✍ Gaworzewski, P. ;Schmalz, K. 📂 Article 📅 1983 🏛 John Wiley and Sons 🌐 English ⚖ 863 KB

Maximum Concentration of Thermal Donors

✍ Gaworzewski, P. ;Hild, E. 📂 Article 📅 1986 🏛 John Wiley and Sons 🌐 English ⚖ 322 KB

Generation and annihilation of thermal d

✍ F. Vettese; J. Sicart; J.L. Robert; S. Cristoloveanu; J. Margail; C. Jaussaud 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 606 KB

Trap spectrum of the “new oxygen donor”

✍ K. Hölzlein; G. Pensl; M. Schulz 📂 Article 📅 1984 🏛 Springer 🌐 English ⚖ 624 KB

Some characteristic properties of therma

✍ Babich, V. M. ;Dotsenko, Yu. P. ;Kovalchuk, V. B. 📂 Article 📅 1984 🏛 John Wiley and Sons 🌐 English ⚖ 192 KB

Formation of new donors in Cz-grown sili

✍ Reichel, J. ;Reiche, M. ;Zuber, E. 📂 Article 📅 1990 🏛 John Wiley and Sons 🌐 English ⚖ 702 KB