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New etching process for device fabrication using diamond

โœ Scribed by Hwang, D.S.; Saito, T.; Fujimori, N.


Book ID
123234000
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
246 KB
Volume
13
Category
Article
ISSN
0925-9635

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Dry etch processes for optoelectronic de
โœ Roy Szweda ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 584 KB

In Issue 5, 2ooo we looked at the technical and business trends in etch processes for manufacturing gallium arsenide electronic devices. Here we turn to the application of dry etching to fabrication of optoelectronic devices -a much broader area (covering GaAs, lnP as well as GaN and II-Vl materials