๐”– Bobbio Scriptorium
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New EPR Spectrum in Helium-Implanted Silicon

โœ Scribed by Yu. V. Gorelkinskii; N. N. Nevinnyi; A. A. Kim


Publisher
John Wiley and Sons
Year
1985
Tongue
English
Weight
159 KB
Volume
130
Category
Article
ISSN
0370-1972

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Nano-bubbles or voids introduced by He implantation before the oxygen implantation collect oxygen and increase the oxygen content in the sample. Furthermore, nano-bubbles or voids can trap Si interstitials to decrease the dislocations at the edge of precipitates. The density and shape of precipitate